Surface degreasing and activation as important factors for Cu electroplating on ITO substrates
statement of authorship
M. Altosaar, T. Varema, E. Mellikov
source
Integrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts
location of publication
Porto
publisher
year of publication
pages
p. 234-235
subject term
ISBN
0-7727-4802-0
language
inglise
Altosaar, M., Varema, T., Mellikov, E. Surface degreasing and activation as important factors for Cu electroplating on ITO substrates // Integrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts. Porto : University of Porto, 1999. p. 234-235.