Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films
author
Revathi, Naidu
Loorits, Mihkel
Kärber, Erki
Volobujeva, Olga
Raudoja, Jaan
Maticiuc, Natalia
Bereznev, Sergei
Mellikov, Enn
statement of authorship
Revathi Naidu, Mihkel Loorits, Erki Kärber, Olga Volobujeva, Jaan Raudoja, Natalia Maticiuc, Sergei Bereznev, Enn Mellikov
source
Materials science in semiconductor processing
publisher
Elsevier
journal volume number month
vol. 71
year of publication
2017
pages
p. 252-257 : ill
url
https://doi.org/10.1016/j.mssp.2017.08.004
subject term
õhukesed kiled
mikrostruktuur
elektrilised omadused
vaakumitehnika
keyword
SnS thin films
annealing
N2 ambient pressure
microstructural
electrical properties
ISSN
1369-8001
notes
Bibliogr.: 27 ref
scientific publication
teaduspublikatsioon
classifier
1.1
Scopus
https://www.scopus.com/sourceid/26675
https://www.scopus.com/record/display.uri?eid=2-s2.0-85029812537&origin=inward&txGid=6d3bd160a0d8969a6a8364fefa35008b
WOS
https://jcr.clarivate.com/jcr-jp/journal-profile?journal=MAT%20SCI%20SEMICON%20PROC&year=2017
https://www.webofscience.com/wos/woscc/full-record/WOS:000412963700037
category (general)
Engineering
Tehnika
Physics and astronomy
Füüsika ja astronoomia
Materials science
Materjaliteadus
category (sub)
Engineering. Mechanical engineering
Tehnika. Masinaehitus
Physics and astronomy. Condensed matter physics
Füüsika ja astronoomia. Kondenseeritud aine füüsika
Engineering. Mechanics of materials
Tehnika. Materjalide mehaanika
Materials science. General materials science
Materjaliteadus. Üldine materjaliteadus
quartile
Q2
TalTech department
materjali- ja keskkonnatehnoloogia instituut
language
inglise