Solution processed high-K oxides for application as gate dielectric layer in thin film transistor
author
Oluwabi, Abayomi Titilope
Katerski, Atanas
Mere, Arvo
Krunks, Malle
Oja Acik, Ilona
statement of authorship
Abayomi Titilope Oluwabi, Atanas Katerski, Arvo Mare, Malle Krunks, Ilona Oja Acik
source
GSFMT Scientific Conference 2020 : Tallinn, February 4-5, 2020 : abstracts
location of publication
Tartu
publisher
[s.n]
year of publication
2020
pages
p. 67 : ill
conference name, date
ASTRA „TTÜ Institutional Development Programme for 2016-2022“ : Graduate School of Functional materials and technologies Scientific Conference 2020, February 4-5, 2020
conference location
Park Inn by Radisson Meriton Conference & Spa Hotel, Tallinn
url
http://fmtdk.ut.ee/wp-content/uploads/2020/01/GSFMT2020.p
subject term
pürolüüs
õhukesed kiled
fotoelektronspektroskoopia
notes
ASTRA „TTÜ Institutional Development Programme for 2016-2022“
FMTDK teaduskonverents 2020
TalTech department
materjali- ja keskkonnatehnoloogia instituut
language
eesti