• Understanding and control of stress at Si-SiO2 interfaceKropman, Daniel; Seeman, Viktor; Medvids, Arturs; Onufrijevs, Pavels; Vitusevich, Svetlana; Mikli, ValdekKey engineering materials2020 / p. 291−296 https://doi.org/10.4028/www.scientific.net/KEM.850.291 https://www.scopus.com/sourceid/12378 https://www.scopus.com/record/display.uri?eid=2-s2.0-85088298651&origin=inward&txGid=57d66fc6d526d749bfec9d1fdbf4390a