Stress relaxation mechanism by strain in the Si-SiO2 system and its influence on the interface properties

vastutusandmed
Daniel Kropman, Enn Mellikov, Tiit Kärner, Tõnu Laas, Arthur Medvid, Pavels Onufrijevs, Edvins Dauksta
ajakirja aastakäik number kuu
Vol. 178/179
ilmumisaasta
leheküljed
p. 259-262
võtmesõna
EPR
Si-SiO2-Si3N4 interface
ISSN
1012-0394
keel
inglise
Kropman, D., Mellikov, E., Kärner, T., Laas, T., Medvid, A., Onufrijevs, P., Dauksta, E. Stress relaxation mechanism by strain in the Si-SiO2 system and its influence on the interface properties // Solid state phenomena (2011) Vol. 178/179, p. 259-262.