Kropman, D., Poll, V., Kärner, T., Ugaste, Ü., Mellikov, E., Arbu, U., Paomets, V.

Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation

author

Kropman, Daniel

Poll, V.

Kärner, T.

Ugaste, Ülo

Mellikov, Enn

Arbu, Uno

Paomets, V.

statement of authorship

D.Kropman, V.Poll, T.Kärner, Ü.Ugaste, E.Mellikov, U.Arbu, V.Paomets

source

Physica status solidi (a)

journal volume number month

198

year of publication

2003

pages

2, p. 297-301

url

https://onlinelibrary.wiley.com/doi/abs/10.1002/pssa.200306611

subject term

räniühendid

magnetresonants

elektronmikroskoopia

ISSN

0031-8965

language

inglise

Kropman, D., Poll, V., Kärner, T., Ugaste, Ü., Mellikov, E., Arbu, U., Paomets, V. Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation // Physica status solidi (a) (2003) 198, 2, p. 297-301. https://onlinelibrary.wiley.com/doi/abs/10.1002/pssa.200306611