Surface degreasing and activation as important factors for Cu electroplating on ITO substrates

statement of authorship
M. Altosaar, T. Varema, E. Mellikov
source
Integrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts
location of publication
Porto
year of publication
pages
p. 234-235
ISBN
0-7727-4802-0
language
inglise