Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films
author
Revathi, Naidu
Loorits, Mihkel
Kärber, Erki
Volobujeva, Olga
Raudoja, Jaan
Maticiuc, Natalia
Bereznev, Sergei
Mellikov, Enn
statement of authorship
Revathi Naidu, Mihkel Loorits, Erki Kärber, Olga Volobujeva, Jaan Raudoja, Natalia Maticiuc, Sergei Bereznev, Enn Mellikov
source
Materials science in semiconductor processing
journal volume number month
vol. 71
year of publication
2017
pages
p. 252-257 : ill
url
https://doi.org/10.1016/j.mssp.2017.08.004
subject term
õhukesed kiled
mikrostruktuur
elektrilised omadused
vaakumitehnika
keyword
SnS thin films
annealing
N2 ambient pressure
microstructural
electrical properties
ISSN
1369-8001
notes
Bibliogr.: 27 ref
TTÜ department
materjali- ja keskkonnatehnoloogia instituut
language
inglise