Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface

statement of authorship
D.Kropman, E.Mellikov, A.Öpik, K.Lott, T.Kärner, I.Heinmaa, T.Laas, A.Medvid, W.Skroupa, S.Prucnal, L.Rebohle, S.Zvyagin, E.Cizmar, M.Ozerov, J.Wosnitsa
journal volume number month
Vol. 518
year of publication
pages
9, p. 2374-2376
ISSN
0040-6090
language
inglise
Kropman, D., Mellikov, E., Öpik, A., Lott, K., Kärner, T., Heinmaa, I., Laas, T., Medvid, A., Skroupa, W., Prucnal, S., Rebohle, L., Zvyagin, S., Cizmar, E., Ozerov, M., Wosnitsa, J. Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface // Thin solid films (2010) Vol. 518, 9, p. 2374-2376. https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564