Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formation
author
Kropman, Daniel
Kärner, T.
Abru, Uno
Ugaste, Ülo
Mellikov, Enn
statement of authorship
D.Kropman, T.Kärner, U.Abru, Ü.Ugaste, E.Mellikov
source
Thin solid films
journal volume number month
459
year of publication
2004
pages
1/2, p. 53-57 : ill
ISSN
0040-6090
notes
Bibliogr.: 13 ref