A post-deposition annealing approach for organic residues control in TiO2 and its impact on Sb2Se3/TiO2 device performance
author
Koltsov, Mykhailo
Krautmann, Robert
Katerski, Atanas
Maticiuc, Natalia
Krunks, Malle
Oja Acik, Ilona
Spalatu, Nicolae
statement of authorship
Mykhailo Koltsov, Robert Krautmann, Atanas Katerski, Natalia Maticiuc, Malle Krunks, Ilona Oja Acik and Nicolae Spalatu
source
Faraday Discussions
publisher
Royal Society of Chemistry
journal volume number month
vol. 239
year of publication
2022
pages
p. 273-286
url
https://doi.org/10.1039/D2FD00064D
subject term
pürolüüs
fotogalvaanika
vaakumitehnika
ISSN
1359-6640
1364-5498
Open Access
Open Access
scientific publication
teaduspublikatsioon
classifier
1.1
Scopus
Journal metrics at Scopus
Article at Scopus
WOS
Journal metrics at WOS
Article at WOS
category (general)
Chemistry
en
Keemia
et
category (sub)
Chemistry. Physical and theoretical chemistry
en
Keemia. Füüsikaline ja teoreetiline keemia
et
kvartiil
Q2
TTÜ department
materjali- ja keskkonnatehnoloogia instituut
language
inglise
Uurimisrühm
Laboratory of chemical thin film technologies