Understanding and control of stress at Si-SiO2 interface
author
Kropman, Daniel
Seeman, Viktor
Medvids, Arturs
Onufrijevs, Pavels
Vitusevich, Svetlana
Mikli, Valdek
statement of authorship
Daniel Kropman, Viktor Seeman, Arturs Medvids, Pavels Onufrijevs, Svetlana Vitusevich, Valdek Mikli
source
Key engineering materials
publisher
Trans Tech Publications
journal volume number month
vol. 850
year of publication
2020
pages
p. 291−296
conference name, date
60th International Scientific Conference of Riga Technical University Section of Materials Science and Applied Chemistry, MSAC 2019, 24 October 2019
conference location
Riga, Latvia
url
https://doi.org/10.4028/www.scientific.net/KEM.850.291
subject term
skaneeriv elektronmikroskoopia
röntgenspektroskoopia
metall-oksiid pooljuhid
keyword
EPR
SEM
Si-SiO2 interface
stress relaxation
ISSN
1662-9795
1013-9826
notes
Bibliogr.: 6 ref
scientific publication
teaduspublikatsioon
classifier
3.1
Scopus
https://www.scopus.com/sourceid/12378
https://www.scopus.com/record/display.uri?eid=2-s2.0-85088298651&origin=inward&txGid=57d66fc6d526d749bfec9d1fdbf4390a
category (general)
Engineering
Tehnika
Materials science
Materjaliteadus
category (sub)
Engineering. Mechanical engineering
Tehnika. Masinaehitus
Engineering. Mechanics of materials
Tehnika. Materjalide mehaanika
Materials science. General materials science
Materjaliteadus. Üldine materjaliteadus
quartile
Q4
TalTech department
materjali- ja keskkonnatehnoloogia instituut
language
inglise
Reserch Group
Laboratory of photovoltaic materials