Study of ion implanted Fe depth distribution in Si after pulsed ion beam treatment
author
Angelov, Christo
Georgiev, S.
Amov, Blagoj
Goranova, E.
Mikli, Valdek
Dezsi, I.
Kotai, E.
statement of authorship
Ch.Angelov, S.Georgiev, B.Amov, E.Goranova, V.Mikli, I.Dezsi, E.Kotai
source
Journal of optoelectronics and advanced materials
journal volume number month
9
year of publication
2007
pages
2, p. 307-310
url
https://www.researchgate.net/publication/289186791_Study_of_the_ion_implanted_Fe_depth_distribution_in_Si_after_pulsed_ion_beam_treatment
subject term
ioonkiired
süntees
raud
räni
ISSN
1454-4164
language
inglise