Solution processed high-K oxides for application as gate dielectric layer in thin film transistorOluwabi, Abayomi Titilope; Katerski, Atanas; Mere, Arvo; Krunks, Malle; Oja Acik, IlonaGSFMT Scientific Conference 2020 : Tallinn, February 4-5, 2020 : abstracts2020 / p. 67 : ill http://fmtdk.ut.ee/wp-content/uploads/2020/01/GSFMT2020.p