Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation
author
statement of authorship
D.Kropman, V.Poll, T.Kärner, Ü.Ugaste, E.Mellikov, U.Arbu, V.Paomets
source
journal volume number month
198
year of publication
pages
2, p. 297-301
ISSN
0031-8965
language
inglise
Kropman, D., Poll, V., Kärner, T., Ugaste, Ü., Mellikov, E., Arbu, U., Paomets, V. Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation // Physica status solidi (a) (2003) 198, 2, p. 297-301.