Trace-Metal Hyper-Enrichment in Tremadocian Black Shales of the Baltic Palaeobasin: Mechanisms and Palaeoenvironmental Implications = Jälgmetallide hüperrikastumine Balti Paleobassini Tremadoci-ealistes mustades kiltades: mehhanismid ja tekkekeskkond
author
supervisor
statement of authorship
Mawo Ndiaye ; [supervisor: Rutt Hints ; Tallinn University of Technology, School of Science, Department of Geology]
type of dissertation
doktoritöö
university/scientific institution
Tallinna Tehnikaülikool
location of publication
Tallinn
publisher
year of publication
pages
100 p
series
Tallinn University of Technology. Doctoral thesis = Tallinna Tehnikaülikool. Doktoritöö ; 7/2026
subject term
subject of form
ISSN
2585-6898
2585-6901 (PDF)
ISBN
978-9916-80-448-3 (PDF)
978-9916-80-447-6
notes
Autori publikatsioonide nimekiri leheküljel 6
Bibliograafia lehekülgedel 41-49
Kokkuvõte eesti keeles
Kättesaadav ka võrguteavikuna
Autori CV inglise ja eesti keeles, lk. 95-100
Thesis (Ph.D. in Earth Sciences) : Tallinn University of Technology, 2026
url
Open Access
Open Access
scientific publication
teaduspublikatsioon
classifier
TalTech department
language
inglise
- Nitrogen and organic carbon isotope record in Tremadocian highly metalliferous black shales from Baltica
- Fine clay shuttle as a key mechanism for V hyper-enrichment in shallow water Tremadocian black shale from Baltica
- Trace-metal hyper-enrichment in Tremadocian black shales of the Baltic Palaeobasin linked to transgression and ultra-slow sedimentation rates
Ndiaye, M. Trace-Metal Hyper-Enrichment in Tremadocian Black Shales of the Baltic Palaeobasin: Mechanisms and Palaeoenvironmental Implications = Jälgmetallide hüperrikastumine Balti Paleobassini Tremadoci-ealistes mustades kiltades: mehhanismid ja tekkekeskkond. Tallinn : TalTech Press, 2026. 100 p. (Tallinn University of Technology. Doctoral thesis = Tallinna Tehnikaülikool. Doktoritöö ; 7/2026). https://www.ester.ee/record=b6024863*est https://digikogu.taltech.ee/et/Item/91c15220-9e15-40c0-8b87-fcfdd7d7d2a6 https://doi.org/10.23658/taltech.7/2026