Hydrogen interaction with point defects in the Si-SiO2 structures and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, T.; Ugaste, Ülo; Laas, Tõnu; Heinmaa, I.; Abru, Uno; Medvid, A.Solid state phenomena2008 / p. 345-350

Impurity interaction with point defects in the Si-SiO2 structures and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, T.; Ugaste, Ülo; Laas, Tõnu; Heinmaa, I.; Medvid, A.Materials science and engineering : B2006 / p. 222-226 : ill https://www.sciencedirect.com/science/article/pii/S0921510706004375

Interaction between point defects in the Si-Si=2 systemKropman, Daniel; Kärner, T.; Samoson, Ago; Heinmaa, I.; Mellikov, EnnNuclear instruments & methods in physics research. Section B2002 / p. 78-82

Interaction between point defects in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Samoson, Ago; Heidmaa, I.; Ugaste, Ülo; Mellikov, EnnDefect and Diffusion Forum2001 / p. 1737-1744

Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, EnnThin solid films2004 / 1/2, p. 53-57 : ill

Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, Enn; Kauk, MaritMaterials science and engineering : B2004 / p. 295-298 : ill

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Lott, Kalju; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.; Skroupa, W.; Prucnal, S.; Zvyagin, S.; Cizmar, E.; Ozerov, M.; Wosnitsa, J.Solid state phenomena2010 / p. 145-148 : ill https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.; Skroupa, W.; Prucnal, S.; Rebohle, L.; Zvyagin, S.; Cizmar, E.; Ozerov, M.; Wosnitsa, J.Thin solid films2010 / 9, p. 2374-2376 https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Lott, Kalju; Kärner, T.; Heinmaa, I.Getterring and defect engineering in semiconductor technology XIII : CADEST 2009 : proceedings of the XIIIth International Autumn Meeting, Döllnsee-Schorfheide, north of Berlin, Germany, September 26 - October 02, 20092010 / p. 145-148 : ill

Interaktsioon punktdefektide ja lisandite vahel süsteemis Si-SiO2 ja nende mõju piirpinna omadustele : [ettekande sisukokkuvõte]Kropman, Daniel; Kärner, T.; Heinmaa, I.Eesti Füüsika Seltsi aastaraamat 20082009 / lk. 119-120

Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formationKropman, Daniel; Poll, V.; Kärner, T.; Ugaste, Ülo; Mellikov, Enn; Arbu, Uno; Paomets, V.Physica status solidi (a)2003 / 2, p. 297-301 https://onlinelibrary.wiley.com/doi/abs/10.1002/pssa.200306611

Point defects interaction with extended defects and impurities and its influence on the Si-SiO2 system propertiesKropman, Daniel; Arbu, Uno; Kärner, T.; Ugaste, Ülo; Mellikov, Enn; Kauk, Marit; Heinmaa, I.; Samoson, Ago; Medvid, A.Gettering and defect engineering in semiconductor technology. XI2005 / p. 333-338 : ill

Point defects interaction with extended defects in the Si-SiO2 system [Electronic resource]Kropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, EnnProceedings IVC-16 : Venice, 20042004 / p. SS1-TuP394 [CD-ROM]

Strain relaxation mechanism in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Volobujeva, Olga; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.Radiation Interaction with Materials and its use in Technologies : Kaunas, 24-27.09.20082008 / p. 204-207

Strain relaxation mechanism in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Volobujeva, Olga; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.Physica B : condensed matter2009 / 23/24, p. 5153-5155 : ill