Surface degreasing and activation as important factors for Cu electroplating on ITO substratesAltosaar, Mare; Varema, Tiit; Mellikov, EnnIntegrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts1999 / p. 234-235

Surface degreasing and activation as important factors for Cu electroplating on ITO substratesAltosaar, Mare; Varema, Tiit; Mellikov, EnnProceedings of the 2nd International Conference, 27-29th April 2000, Tallinn, Estonia / DAAAM International Vienna, DAAAM National Estonia2000 / p. 233-235 : ill