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• Combinative solution processing and Li doping approach to develop p-type NiO thin films with enchanced electrical propertiesOluwabi, Abayomi Titilope; Spalatu, Nicolae; Maticiuc, Natalia; Katerski, Atanas; Mere, Arvo; Krunks, Malle; Oja Acik, IlonaFrontiers in materials2023 / 12 p. : ill https://doi.org/10.3389/fmats.2023.1060420 https://www.scopus.com/sourceid/21100900363 https://www.scopus.com/record/display.uri?eid=2-s2.0-85148327008&origin=inward&txGid=972302abaaabe6d73b43e05396fead9a https://jcr.clarivate.com/jcr-jp/journal-profile?journal=FRONT%20MATER&year=2023 https://www.webofscience.com/wos/woscc/full-record/WOS:000933668300001
• Effect of Zr doping on the structural and electrical properties of spray deposited TiO2 thin filmsOluwabi, Abayomi Titilope; Juma, Albert Owino; Oja Acik, Ilona; Mere, Arvo; Krunks, MalleProceedings of the Estonian Academy of Sciences2018 / p. 147–157 : ill https://doi.org/10.3176/proc.2018.2.05 https://www.scopus.com/sourceid/11500153303 https://www.scopus.com/record/display.uri?eid=2-s2.0-85047549406&origin=inward&txGid=98440a299453a052c032b431ecd965c3 https://jcr.clarivate.com/jcr-jp/journal-profile?journal=P%20EST%20ACAD%20SCI&year=2022 https://www.webofscience.com/wos/woscc/full-record/WOS:000431735600005
• High-K ZrO2 thin films by chemical spray pyrolysis method [Online resource]Oluwabi, Abayomi Titilope; Oja Acik, Ilona; Katerski, Atanas; Krunks, MalleTartu Ülikooli ASTRA projekt PER ASPERA : Funktsionaalsed materjalid ja tehnoloogiad : [7-8 märtsil 2018, Tallinn : teesid] GSFMT Scientific Conference 2018 : Tallinn, March 7-8, 2018 : abstracts2018 / 1 p http://fmtdk.ut.ee/teesid-2018/
• High-κ metal oxide thin film by chemical spray pyrolysis : from optimization of material properties to application in thin film transistor = Metallioksiidi õhukesed kiled keemilise pihustuspürolüüsi meetodil : materjali omaduste optimeerimine ja rakendamine õhukesekilelistes transistoridesOluwabi, Abayomi Titilope2020 https://digikogu.taltech.ee/et/Item/4b6d9afd-74d2-40ac-9c12-335d2f608474 https://www.ester.ee/record=b5362429*est
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• Solution processed high-K oxides for application as gate dielectric layer in thin film transistorOluwabi, Abayomi Titilope; Katerski, Atanas; Mere, Arvo; Krunks, Malle; Oja Acik, IlonaGSFMT Scientific Conference 2020 : Tallinn, February 4-5, 2020 : abstracts2020 / p. 67 : ill http://fmtdk.ut.ee/wp-content/uploads/2020/01/GSFMT2020.p
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• Zirconium doped TiO2 thin films deposited by chemical spray pyrolysisJuma, Albert Owino; Oja Acik, Ilona; Oluwabi, Abayomi Titilope; Mere, Arvo; Mikli, Valdek; Danilson, Mati; Krunks, MalleApplied surface science2016 / p. 539-545 : ill https://doi.org/10.1016/j.apsusc.2016.06.093 https://www.scopus.com/sourceid/28983 https://www.scopus.com/record/display.uri?eid=2-s2.0-84977100510&origin=inward&txGid=94fb0e515e37aaf737627c033e745de8 https://jcr.clarivate.com/jcr-jp/journal-profile?journal=APPL%20SURF%20SCI&year=2023 https://www.webofscience.com/wos/woscc/full-record/WOS:000381251100067