Revathi, N., Loorits, M., Kärber, E., Volobujeva, O., Raudoja, J., Maticiuc, N., Bereznev, S., Mellikov, E.

Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films

author

Revathi, Naidu

Loorits, Mihkel

Kärber, Erki

Volobujeva, Olga

Raudoja, Jaan

Maticiuc, Natalia

Bereznev, Sergei

Mellikov, Enn

statement of authorship

Revathi Naidu, Mihkel Loorits, Erki Kärber, Olga Volobujeva, Jaan Raudoja, Natalia Maticiuc, Sergei Bereznev, Enn Mellikov

source

Materials science in semiconductor processing

publisher

Elsevier

journal volume number month

vol. 71

year of publication

2017

pages

p. 252-257 : ill

url

https://doi.org/10.1016/j.mssp.2017.08.004

subject term

õhukesed kiled

mikrostruktuur

elektrilised omadused

vaakumitehnika

keyword

SnS thin films

annealing

N2 ambient pressure

microstructural

electrical properties

ISSN

1369-8001

notes

Bibliogr.: 27 ref

scientific publication

teaduspublikatsioon

classifier

1.1

Scopus

Journal metrics at Scopus

Article at Scopus

WOS

Journal metrics at WOS

Article at WOS

category (general)

Engineering

Physics and astronomy

Materials science

category (sub)

Engineering. Mechanical engineering

Physics and astronomy. Condensed matter physics

Engineering. Mechanics of materials

Materials science. General materials science

kvartiil

TTÜ department

materjali- ja keskkonnatehnoloogia instituut

language

inglise

Revathi, N., Loorits, M., Kärber, E., Volobujeva, O., Raudoja, J., Maticiuc, N., Bereznev, S., Mellikov, E. Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films // Materials science in semiconductor processing (2017) vol. 71, p. 252-257 : ill. https://doi.org/10.1016/j.mssp.2017.08.004