Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface
author
statement of authorship
D.Kropman, E.Mellikov, A.Öpik, K.Lott, T.Kärner, I.Heinmaa, T.Laas, A.Medvid, W.Skroupa, S.Prucnal, L.Rebohle, S.Zvyagin, E.Cizmar, M.Ozerov, J.Wosnitsa
source
journal volume number month
Vol. 518
year of publication
pages
9, p. 2374-2376
subject term
ISSN
0040-6090
language
inglise
Kropman, D., Mellikov, E., Öpik, A., Lott, K., Kärner, T., Heinmaa, I., Laas, T., Medvid, A., Skroupa, W., Prucnal, S., Rebohle, L., Zvyagin, S., Cizmar, E., Ozerov, M., Wosnitsa, J. Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface // Thin solid films (2010) Vol. 518, 9, p. 2374-2376. https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564