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Atomic layer deposition of aluminaon g-Al2O3 nanoﬁbresJõgiaas, Taivo; Arroval, Tõnis; Kollo, Lauri; Hussainova, IrinaPhysica status solidi (a) : applications and materials science2014 / p. 403-408 : ill https://doi.org/10.1002/pssa.201330083 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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2

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Atomic layer deposition of high-k dielectrics on carbon nanoparticlesTamm, Aile; Koel, Mihkel; Peikolainen, Anna-LiisaThin solid films2013 / p. 16-20 : ill https://doi.org/10.1016/j.tsf.2012.09.071 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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3

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Effect of atomic layer deposited aluminium oxide on mechanical properties of porous silicon carbideJõgiaas, Taivo; Kollo, Lauri; Kozlova, Jekaterina; Tamm, Aile; Hussainova, Irina; Kukli, KaupoCeramics international2015 / p. 7519-7528 : ill https://doi.org/10.1016/j.ceramint.2015.02.074 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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4

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Mechanical and tribological properties of 100-nm thick alumina films prepared by atomic layer deposition on Si(100) substratesAlamgir, Asad; Bogatov, Andrei; Yashin, Maxim; Podgurski, VitaliProceedings of the Estonian Academy of Sciences2019 / p. 126-130 : ill https://doi.org/10.3176/proc.2019.2.01 http://www.kirj.ee/public/proceedings_pdf/2019/issue_2/proc-2019-2-126-130.pdf Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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5

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Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer depositionJõgiaas, Taivo; Zabels, Roberts; Tamm, Aile; Merisalu, Maido; Hussainova, IrinaSurface and coatings technology2015 / p. 36-42 : ill https://doi.org/10.1016/j.surfcoat.2015.10.008 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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6

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Metal oxide nanoparticles embedded in rare-earth matrix for low temperature thermal imaging applicationsRauwel, Erwan; Galeckas, Augustinas; Rauwel, Protima; Hansen, P.-A.; Wragg, David; Nilsen, Ola; Fjellvag, H.Materials research express2016 / p. 1-11 : ill https://doi.org/10.1088/2053-1591/3/5/055010 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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Plasmon resonance effect caused by gold nanoparticles formed on titanium oxide filmsTamm, Aile; Oja Acik, Ilona; Krunks, Malle; Mere, ArvoThin solid films2016 / p. 449-455 : ill https://doi.org/10.1016/j.tsf.2016.08.059 Journal metrics at Scopus Article at Scopus Journal metrics at WOS Article at WOS

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8

journal article

Sb2S3 solar cells with TiO2 electron transporting layers synthesized by ALD and USP methodsDedova, Tatjana; Krautmann, Robert; Rusu, Marin; Katerski, Atanas; Krunks, Malle; Unold, Thomas; Spalatu, Nicolae; Mere, Arvo; Sydorenko, Jekaterina; Sibinski, Maciej; Oja Acik, IlonaSolar energy materials and solar cells2025 / art. 113279 https://doi.org/10.1016/j.solmat.2024.113279

journal article

Number of records 8, displaying 1 - 8

1. atomic layer deposition
2. atomic layer deposition (ALD)
3. atomic force microscopy
4. atomic force microscopy (AFM)
5. atomic NFA
6. atomic oxygen irradiation
7. atomic structure
8. atomic structures
9. atomic weight
10. aerosol assisted chemical vapour deposition (AACVD)
11. chemical bath deposition
12. chemical post-deposition treatment
13. Chemical Vapor Deposition
14. chemical-bath deposition
15. deposition
16. direct energy deposition
17. directed energy deposition
18. Dust deposition
19. Electro deposition
20. fused deposition modeling
21. fused deposition modeling (FDM)
22. fused deposition modelling
23. hemical vapor deposition
24. laser melting deposition (LMD)
25. laser metal deposition
26. laser repair deposition
27. laser-assisted directed energy deposition
28. particles deposition
29. Pb-210 deposition
30. physical vapor deposition
31. physical vapour deposition coatings
32. pollen deposition
33. post deposition annealing
34. Post-deposition treatment
35. pulsed laser deposition
36. ship nitrogen deposition
37. solution‐based deposition
38. spray deposition
39. surface deposition
40. Vacuum deposition
41. vapor deposition
42. vapor transport deposition
43. absorber layer
44. abstraction layer
45. additive layer manufacturing
46. bottom boundary layer
47. boundary layer
48. buffer layer
49. Cd-free buffer layer
50. composite layer
51. cross-layer
52. cross-layer fault tolerance
53. cross-layer reliability
54. deep layer
55. double-layer capacitance
56. Ekman layer
57. electric double-layer
58. electron transport layer
59. Equivalent single layer
60. glaze layer
61. hole transport layer
62. interface layer
63. layer fusion
64. layer growing curvature method
65. layer removing
66. layer-wise displacement theory
67. MAC layer
68. maximal two-layer exchange
69. mechanically mixed layer (MML)
70. mixed layer drifter
71. monograin layer solar cell
72. monograin layer solar cells
73. network layer
74. oxide layer
75. physical layer
76. seed layer
77. selenium capping layer
78. SiO2 interface layer
79. sub-maximal two-layer exchange
80. zero-strenght-layer
81. zero‐strength layer
82. zero-strength layer
83. zero‐strength layer
84. ZnS buffer layer
85. thin layer chromatography
86. Thin layer chromatography (TLC)
87. thin-layer chromatography
88. thin-layer rendering
89. thin-layer rendering system
90. thin-layer rendering systems
91. TiO2 electron transport layer
92. tribo-layer
93. upper mixed layer

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