Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation
autor
vastutusandmed
D.Kropman, V.Poll, T.Kärner, Ü.Ugaste, E.Mellikov, U.Arbu, V.Paomets
allikas
ajakirja aastakäik number kuu
198
ilmumisaasta
leheküljed
2, p. 297-301
ISSN
0031-8965
keel
inglise
Kropman, D., Poll, V., Kärner, T., Ugaste, Ü., Mellikov, E., Arbu, U., Paomets, V. Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation // Physica status solidi (a) (2003) 198, 2, p. 297-301.