Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation

statement of authorship
D.Kropman, V.Poll, T.Kärner, Ü.Ugaste, E.Mellikov, U.Arbu, V.Paomets
journal volume number month
198
year of publication
pages
2, p. 297-301
ISSN
0031-8965
language
inglise
Kropman, D., Poll, V., Kärner, T., Ugaste, Ü., Mellikov, E., Arbu, U., Paomets, V. Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formation // Physica status solidi (a) (2003) 198, 2, p. 297-301. https://onlinelibrary.wiley.com/doi/abs/10.1002/pssa.200306611