Angelov, Ch., Georgiev, S., Amov, B., Goranova, E., Mikli, V., Dezsi, I., Kotai, E. - TalTech Research Portal

print

Study of ion implanted Fe depth distribution in Si after pulsed ion beam treatment

author

Angelov, Christo

Georgiev, S.

Amov, Blagoj

Goranova, E.

Mikli, Valdek

Dezsi, I.

Kotai, E.

statement of authorship

Ch.Angelov, S.Georgiev, B.Amov, E.Goranova, V.Mikli, I.Dezsi, E.Kotai

source

Journal of optoelectronics and advanced materials

journal volume number month

9

year of publication

2007

pages

2, p. 307-310

url

https://www.researchgate.net/publication/289186791_Study_of_the_ion_implanted_Fe_depth_distribution_in_Si_after_pulsed_ion_beam_treatment

subject term

ioonkiired

süntees

raud

räni

ISSN

1454-4164

language

inglise

Angelov, Ch., Georgiev, S., Amov, B., Goranova, E., Mikli, V., Dezsi, I., Kotai, E. Study of ion implanted Fe depth distribution in Si after pulsed ion beam treatment // Journal of optoelectronics and advanced materials (2007) 9, 2, p. 307-310. https://www.researchgate.net/publication/289186791_Study_of_the_ion_implanted_Fe_depth_distribution_in_Si_after_pulsed_ion_beam_treatment