Study of ion implanted Fe depth distribution in Si after pulsed ion beam treatment
author
statement of authorship
Ch.Angelov, S.Georgiev, B.Amov, E.Goranova, V.Mikli, I.Dezsi, E.Kotai
journal volume number month
9
year of publication
pages
2, p. 307-310
subject term
ISSN
1454-4164
language
inglise
Angelov, Ch., Georgiev, S., Amov, B., Goranova, E., Mikli, V., Dezsi, I., Kotai, E. Study of ion implanted Fe depth distribution in Si after pulsed ion beam treatment // Journal of optoelectronics and advanced materials (2007) 9, 2, p. 307-310.