Revathi, N., Loorits, M., Kärber, E., Volobujeva, O., Raudoja, J., Maticiuc, N., Bereznev, S., Mellikov, E.

Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films

author

Revathi, Naidu

Loorits, Mihkel

Kärber, Erki

Volobujeva, Olga

Raudoja, Jaan

Maticiuc, Natalia

Bereznev, Sergei

Mellikov, Enn

statement of authorship

Revathi Naidu, Mihkel Loorits, Erki Kärber, Olga Volobujeva, Jaan Raudoja, Natalia Maticiuc, Sergei Bereznev, Enn Mellikov

source

Materials science in semiconductor processing

journal volume number month

vol. 71

year of publication

2017

pages

p. 252-257 : ill

url

https://doi.org/10.1016/j.mssp.2017.08.004

subject term

õhukesed kiled

mikrostruktuur

elektrilised omadused

vaakumitehnika

keyword

SnS thin films

annealing

N2 ambient pressure

microstructural

electrical properties

ISSN

1369-8001

notes

Bibliogr.: 27 ref

TTÜ department

materjali- ja keskkonnatehnoloogia instituut

language

inglise

Revathi, N., Loorits, M., Kärber, E., Volobujeva, O., Raudoja, J., Maticiuc, N., Bereznev, S., Mellikov, E. Impact of vacuum and nitrogen annealing on HVE SnS photoabsorber films // Materials science in semiconductor processing (2017) vol. 71, p. 252-257 : ill. https://doi.org/10.1016/j.mssp.2017.08.004