Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor
author
statement of authorship
Abayomi Titilope Oluwabi, Diana Gaspar, Atanas Katerski, Arvo Mere, Malle Krunks, Luis Pereira and Ilona Oja Acik
source
publisher
journal volume number month
vol. 13, 1
year of publication
pages
art. 6, 14 p. : ill
subject term
keyword
Indium-Gallium-Zinc-Oxide
UV-ozone
high-κ dielectrics
thin film transistor
ISSN
1996-1944
notes
Bibliogr.: 47 ref
Open Access
Open Access
scientific publication
teaduspublikatsioon
classifier
category (general)
category (sub)
kvartiil
TTÜ department
language
inglise
Oluwabi, A. T., Gaspar, D., Katerski, A., Mere, A., Krunks, M., Pereira, L., Oja Acik, I. Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor // Materials (2020) vol. 13, 1, art. 6, 14 p. : ill. https://doi.org/10.3390/ma13010006