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Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor

author
statement of authorship
Abayomi Titilope Oluwabi, Diana Gaspar, Atanas Katerski, Arvo Mere, Malle Krunks, Luis Pereira and Ilona Oja Acik
source
publisher
journal volume number month
vol. 13, 1
year of publication
pages
art. 6, 14 p. : ill
url
ISSN
1996-1944
notes
Bibliogr.: 47 ref
Open Access
Open Access
scientific publication
teaduspublikatsioon
language
inglise
subject term
keyword
spray pyrolysis
low-temperature
zirconium oxide
Indium-Gallium-Zinc-Oxide
UV-ozone
high-κ dielectrics
thin film transistor
Reserch Group
Laboratory of thin film energy materials, Laboratory of chemical thin film technologies (until February 28, 2023)
Oluwabi, A. T., Gaspar, D., Katerski, A., Mere, A., Krunks, M., Pereira, L., Oja Acik, I. Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor // Materials (2020) vol. 13, 1, art. 6, 14 p. : ill. https://doi.org/10.3390/ma13010006