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Solution processed high-K oxides for application as gate dielectric layer in thin film transistor (title)
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book article
Solution processed high-K oxides for application as gate dielectric layer in thin film transistor
Oluwabi, Abayomi Titilope
;
Katerski, Atanas
;
Mere, Arvo
;
Krunks, Malle
;
Oja Acik, Ilona
GSFMT Scientific Conference 2020 : Tallinn, February 4-5, 2020 : abstracts
2020
/
p. 67 : ill
http://fmtdk.ut.ee/wp-content/uploads/2020/01/GSFMT2020.p
book article
Number of records 1, displaying
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keyword
3
1.
thin film transistor
2.
dielectric oxides
3.
Gate Injection Transistor (GIT)
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