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Radiation Interaction with Materials and its use in Technologies : Kaunas, 24-27.09.2008 (source)

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Strain relaxation mechanism in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Volobujeva, Olga; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.Radiation Interaction with Materials and its use in Technologies : Kaunas, 24-27.09.20082008 / p. 204-207 https://www.sciencedirect.com/science/article/pii/S0921452609010321

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