Kropman, D., Mellikov, E., Öpik, A., Lott, K., Kärner, T., Heinmaa, I., Laas, T., Medvid, A., Skroupa, W., Prucnal, S., Rebohle, L., Zvyagin, S., Cizmar, E., Ozerov, M., Wosnitsa, J.

full record print

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface

author

Kropman, Daniel

Mellikov, Enn

Öpik, Andres

Lott, Kalju

Kärner, T.

Heinmaa, I.

Laas, Tõnu

Medvid, A.

Skroupa, W.

Prucnal, S.

Rebohle, L.

Zvyagin, S.

Cizmar, E.

Ozerov, M.

Wosnitsa, J.

statement of authorship

D.Kropman, E.Mellikov, A.Öpik, K.Lott, T.Kärner, I.Heinmaa, T.Laas, A.Medvid, W.Skroupa, S.Prucnal, L.Rebohle, S.Zvyagin, E.Cizmar, M.Ozerov, J.Wosnitsa

source

Thin solid films

journal volume number month

Vol. 518

year of publication

2010

pages

9, p. 2374-2376

url

https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564

ISSN

0040-6090

language

inglise

Märksõnad ja võtmesõnad

subject term

õhukesed kiled

tuumamagnetresonants

magnetresonants

Kropman, D., Mellikov, E., Öpik, A., Lott, K., Kärner, T., Heinmaa, I., Laas, T., Medvid, A., Skroupa, W., Prucnal, S., Rebohle, L., Zvyagin, S., Cizmar, E., Ozerov, M., Wosnitsa, J. Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface // Thin solid films (2010) Vol. 518, 9, p. 2374-2376. https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564