Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface
autor
vastutusandmed
D.Kropman, E.Mellikov, A.Öpik, K.Lott, T.Kärner, I.Heinmaa, T.Laas, A.Medvid, W.Skroupa, S.Prucnal, L.Rebohle, S.Zvyagin, E.Cizmar, M.Ozerov, J.Wosnitsa
allikas
ajakirja aastakäik number kuu
Vol. 518
ilmumisaasta
leheküljed
9, p. 2374-2376
ISSN
0040-6090
keel
inglise
Kropman, D., Mellikov, E., Öpik, A., Lott, K., Kärner, T., Heinmaa, I., Laas, T., Medvid, A., Skroupa, W., Prucnal, S., Rebohle, L., Zvyagin, S., Cizmar, E., Ozerov, M., Wosnitsa, J. Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interface // Thin solid films (2010) Vol. 518, 9, p. 2374-2376. https://www.sciencedirect.com/science/article/abs/pii/S0040609009014564