Apparent decrease of diffusion coefficients due to the plasma-induced band gap narrowing
author
statement of authorship
Andres Udal and Enn Velmre
source
19th Nordic Semiconductor Meeting : May 20-23, 2001, Copenhagen, Denmark : abstracts
location of publication
[S.l.]
publisher
Mikroelektronik Centret and Research Center COM, The Technical University of Denmark
year of publication
pages
p. 22 : ill
notes
Bibliogr.: 5 ref
language
inglise
subject term
Udal, A., Velmre, E. Apparent decrease of diffusion coefficients due to the plasma-induced band gap narrowing // 19th Nordic Semiconductor Meeting : May 20-23, 2001, Copenhagen, Denmark : abstracts. [S.l.] : Mikroelektronik Centret and Research Center COM, The Technical University of Denmark, 2001. p. 22 : ill.