Apparent decrease of diffusion coefficients due to the plasma-induced band gap narrowing
autor
vastutusandmed
Andres Udal and Enn Velmre
allikas
19th Nordic Semiconductor Meeting : May 20-23, 2001, Copenhagen, Denmark : abstracts
ilmumiskoht
[S.l.]
kirjastus/väljaandja
Mikroelektronik Centret and Research Center COM, The Technical University of Denmark
ilmumisaasta
leheküljed
p. 22 : ill
märksõna
märkused
Bibliogr.: 5 ref
keel
inglise
Udal, A., Velmre, E. Apparent decrease of diffusion coefficients due to the plasma-induced band gap narrowing // 19th Nordic Semiconductor Meeting : May 20-23, 2001, Copenhagen, Denmark : abstracts. [S.l.] : Mikroelektronik Centret and Research Center COM, The Technical University of Denmark, 2001. p. 22 : ill.