prindi

Surface degreasing and activation as important factors for Cu electroplating on ITO substrates

autor
Altosaar, Mare
Varema, Tiit
Mellikov, Enn
vastutusandmed
Mare Altosaar, Tiit Varema and Enn Mellikov
allikas
Proceedings of the 2nd International Conference, 27-29th April 2000, Tallinn, Estonia / DAAAM International Vienna, DAAAM National Estonia
ilmumiskoht
Tallinn
kirjastus/väljaandja
DAAAM National Estonia, Tallinn TU
ilmumisaasta
2000
leheküljed
p. 233-235 : ill
märksõna
pinnad
aktiveerimine
indiumiühendid
elektrokeemia
ISBN
9985-894-21-9
märkused
Bibliogr.: 5 ref
keel
inglise
Altosaar, M., Varema, T., Mellikov, E. Surface degreasing and activation as important factors for Cu electroplating on ITO substrates // Proceedings of the 2nd International Conference, 27-29th April 2000, Tallinn, Estonia / DAAAM International Vienna, DAAAM National Estonia. Tallinn : DAAAM National Estonia, Tallinn TU, 2000. p. 233-235 : ill.