Surface degreasing and activation as important factors for Cu electroplating on ITO substrates

vastutusandmed
M. Altosaar, T. Varema, E. Mellikov
allikas
Integrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts
ilmumiskoht
Porto
kirjastus/väljaandja
ilmumisaasta
leheküljed
p. 234-235
ISBN
0-7727-4802-0
keel
inglise
Altosaar, M., Varema, T., Mellikov, E. Surface degreasing and activation as important factors for Cu electroplating on ITO substrates // Integrity, Relability, Failure 1999 : July 19-22, Porto, Portugal : book of abstracts. Porto : University of Porto, 1999. p. 234-235.