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Stabilization of higher symmetry HfO2 polymorphs as thin films and nanoparticles

autor
vastutusandmed
Protima Rauwel and Erwan Rauwel
allikas
Hafnium : chemical characteristics, production and applications
ilmumiskoht
New York
kirjastus/väljaandja
ilmumisaasta
leheküljed
p. 77-112 : ill
seeria-sari
Chemistry research and applications
ISBN
978-1-63463-164-8
märkused
Bibliogr.: 104 ref
TTÜ struktuuriüksus
keel
inglise
Rauwel, P., Rauwel, E. Stabilization of higher symmetry HfO2 polymorphs as thin films and nanoparticles // Hafnium : chemical characteristics, production and applications. New York : Nova Science Publishers, 2014. p. 77-112 : ill. (Chemistry research and applications).