Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor

vastutusandmed
Abayomi Titilope Oluwabi, Diana Gaspar, Atanas Katerski, Arvo Mere, Malle Krunks, Luis Pereira and Ilona Oja Acik
allikas
ajakirja aastakäik number kuu
vol. 13, 1
ilmumisaasta
leheküljed
art. 6, 14 p. : ill
võtmesõna
zirconium oxide
Indium-Gallium-Zinc-Oxide
UV-ozone
high-╬║ dielectrics
thin film transistor
ISSN
1996-1944
märkused
Bibliogr.: 47 ref
keel
inglise
Oluwabi, A. T., Gaspar, D., Katerski, A., Mere, A., Krunks, M., Pereira, L., Oja Acik, I. Influence of post-UV/ozone treatment of ultrasonic-sprayed zirconium oxide dielectric films for a low-temperature oxide thin film transistor // Materials (2020) vol. 13, 1, art. 6, 14 p. : ill.