Kropman, D., Kärner, T., Samoson, A., Heidmaa, I., Ugaste, Ü., Mellikov, E.

full record print

Interaction between point defects in the Si-SiO2 system during the process of its formation

author

Kropman, Daniel

Kärner, T.

Samoson, Ago

Heidmaa, I.

Ugaste, Ülo

Mellikov, Enn

statement of authorship

D.Kropman, T.Kärner, A.Samosson, I.Heidmaa, Ü.Ugaste, E.Mellikov

source

Defect and Diffusion Forum

location of publication

[S. l.]

publisher

Elsevier

year of publication

2001

pages

p. 1737-1744

url

https://www.sciencedirect.com/science/article/abs/pii/S0168583X0100862X

language

inglise

Märksõnad ja võtmesõnad

subject term

räni

ränioksiid

punktdefektid

kineetika

elektroni paramagnetresonantsspektroskoopia

tuumamagnetresonantsspektroskoopia

Kropman, D., Kärner, T., Samoson, A., Heidmaa, I., Ugaste, Ü., Mellikov, E. Interaction between point defects in the Si-SiO2 system during the process of its formation // Defect and Diffusion Forum. [S. l.] : Elsevier, 2001. p. 1737-1744. https://www.sciencedirect.com/science/article/abs/pii/S0168583X0100862X