Kropman, D., Kärner, T., Abru, U., Ugaste, Ü., Mellikov, E.*

Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formation

author

Kropman, Daniel

Kärner, T.

Abru, Uno

Ugaste, Ülo

Mellikov, Enn

statement of authorship

D.Kropman, T.Kärner, U.Abru, Ü.Ugaste, E.Mellikov

source

Thin solid films

journal volume number month

459

year of publication

2004

pages

1/2, p. 53-57 : ill

ISSN

0040-6090

notes

Bibliogr.: 13 ref

Kropman, D., Kärner, T., Abru, U., Ugaste, Ü., Mellikov, E.* Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formation // Thin solid films (2004) 459, 1/2, p. 53-57 : ill.