Understanding and control of stress at Si-SiO2 interface
                                            author
                                    
                                    
Vitusevich, Svetlana
                                                    
                                                    
                                            
                                            statement of authorship
                                    
                                    
Daniel Kropman, Viktor Seeman, Arturs Medvids, Pavels Onufrijevs, Svetlana Vitusevich, Valdek Mikli
                                                    
                                            
                                            source
                                    
                                    
                                
                                            publisher
                                    
                                    
                                
                                            journal volume number month
                                    
                                    
vol. 850
                                                    
                                            
                                            year of publication
                                    
                                    
                                
                                            pages
                                    
                                    
p. 291−296
                                                    
                                            
                                            conference name, date
                                    
                                    
60th International Scientific Conference of Riga Technical University Section of Materials Science and Applied Chemistry, MSAC 2019, 24 October 2019
                                                    
                                            
                                            conference location
                                    
                                    
Riga, Latvia
                                                    
                                            
                                            ISSN
                                    
                                    
1662-9795
                                                    
                                                    
1013-9826
                                                    
                                            
                                            notes
                                    
                                    
Bibliogr.: 6 ref
                                                    
                                            
                                            scientific publication
                                    
                                    
teaduspublikatsioon
                                                    
                                            
                                            language
                                    
                                    
inglise
                                                    
                                            
                                            subject term
                                    
                                    
                                            keyword
                                    
                                    
                                
                                            category (general)
                                    
                                    
                                
                                            TalTech department
                                    
                                    
                                
                Reserch Group
            
            
        
                                    Kropman, D., Seeman, V., Medvids, A., Onufrijevs, P., Vitusevich, S., Mikli, V. Understanding and control of stress at Si-SiO2 interface // Key engineering materials (2020) vol. 850, p. 291−296.