Interaction between point defects in the Si-SiO2 system during the process of its formation
author
statement of authorship
D.Kropman, T.Kärner, A.Samosson, I.Heidmaa, Ü.Ugaste, E.Mellikov
source
location of publication
[S. l.]
publisher
year of publication
pages
p. 1737-1744
subject term
tuumamagnetresonantsspektroskoopia|
language
inglise
Kropman, D., Kärner, T., Samoson, A., Heidmaa, I., Ugaste, Ü., Mellikov, E. Interaction between point defects in the Si-SiO2 system during the process of its formation // Defect and Diffusion Forum. [S. l.] : Elsevier, 2001. p. 1737-1744. https://www.sciencedirect.com/science/article/abs/pii/S0168583X0100862X