print

Dependence of multifractal analysis parameters on the darkness of a processed image

author
Martsepp, Merike
Laas, Tõnu
Laas, Katrin
Priimets, Jaanis
Tõkke, Siim
Mikli, Valdek
statement of authorship
Merike Martsepp, Tõnu Laas, Katrin Laas, Jaanis Priimets, Siim Tõkke, Valdek Mikli
source
Chaos, Solitons & Fractals
publisher
Elsevier
journal volume number month
vol. 156
year of publication
2022
pages
art. 111811
url
https://doi.org/10.1016/j.chaos.2022.111811
subject term
volfram
skaneeriv elektronmikroskoopia
optiline mikroskoopia
pilditöötlus
keyword
multifractal analysis
tungsten
Plasma
SEM
optical microscope
image processing
image darkness
ISSN
0960-0779
scientific publication
teaduspublikatsioon
classifier
1.1
Scopus
Journal metrics at Scopus
Article at Scopus
WOS
Journal metrics at WOS
Article at WOS
category (general)
Mathematics
Physics and astronomy
category (sub)
Mathematics. Mathematical physics
Mathematics. Applied mathematics
Physics and astronomy. Statistical and nonlinear physics
Physics and astronomy. General physics and astronomy
kvartiil
Q1
TTÜ department
Eesti Mereakadeemia
materjali- ja keskkonnatehnoloogia instituut
language
eesti
Uurimisrühm
Laboratory of photovoltaic materials
Martsepp, M., Laas, T., Laas, K., Priimets, J., Tõkke, S., Mikli, V. Dependence of multifractal analysis parameters on the darkness of a processed image // Chaos, Solitons & Fractals (2022) vol. 156, art. 111811. https://doi.org/10.1016/j.chaos.2022.111811