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artikkel ajakirjas

Hydrogen interaction with point defects in the Si-SiO2 structures and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, T.; Ugaste, Ülo; Laas, Tõnu; Heinmaa, I.; Abru, Uno; Medvid, A.Solid state phenomena2008 / p. 345-350

artikkel ajakirjas

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artikkel ajakirjas

Impurity interaction with point defects in the Si-SiO2 structures and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, T.; Ugaste, Ülo; Laas, Tõnu; Heinmaa, I.; Medvid, A.Materials science and engineering : B2006 / p. 222-226 : ill

artikkel ajakirjas

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artikkel ajakirjas

Interaction between point defects in the Si-Si=2 systemKropman, Daniel; Kärner, T.; Samoson, Ago; Heinmaa, I.; Mellikov, EnnNuclear instruments & methods in physics research. Section B2002 / p. 78-82

artikkel ajakirjas

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artikkel kogumikus

Interaction between point defects in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Samoson, Ago; Heidmaa, I.; Ugaste, Ülo; Mellikov, EnnDefect and Diffusion Forum2001 / p. 1737-1744

artikkel kogumikus

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artikkel ajakirjas

Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, EnnThin solid films2004 / 1/2, p. 53-57 : ill

artikkel ajakirjas

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artikkel ajakirjas

Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formationKropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, Enn; Kauk, MaritMaterials science and engineering : B2004 / p. 295-298 : ill

artikkel ajakirjas

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artikkel ajakirjas

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, Tiit; Heinmaa, Ivo; Laas, Tõnu; Londos, Charalampos; Misiuk, AndrzejSolid state phenomena2011 / p. 263-266

artikkel ajakirjas

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artikkel ajakirjas

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Kärner, Tiit; Dolgov, Sergei; Heinmaa, Ivo; Laas, Tõnu; Londos, CharalamposPhysica status solidi (c)2011 / p. 694-696 : ill

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artikkel kogumikus

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Kärner, Tiit; Dolgov, Sergei; Heinmaa, Ivo; Laas, Tõnu; Londos, C. A.The 9th International Conference on Global Research and Education : August 9-12, 2010, Riga : digest2010 / p. 231-233

artikkel kogumikus

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artikkel kogumikus

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Lott, Kalju; Kärner, T.; Heinmaa, I.Getterring and defect engineering in semiconductor technology XIII : CADEST 2009 : proceedings of the XIIIth International Autumn Meeting, Döllnsee-Schorfheide, north of Berlin, Germany, September 26 - October 02, 20092010 / p. 145-148 : ill

artikkel kogumikus

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artikkel ajakirjas

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Lott, Kalju; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.; Skroupa, W.; Prucnal, S.; Zvyagin, S.; Cizmar, E.; Ozerov, M.; Wosnitsa, J.Solid state phenomena2010 / p. 145-148 : ill

artikkel ajakirjas

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artikkel ajakirjas

Interaction of point defects with impurities in the Si-SiO2 system and its influence on the properties of the interfaceKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.; Skroupa, W.; Prucnal, S.; Rebohle, L.; Zvyagin, S.; Cizmar, E.; Ozerov, M.; Wosnitsa, J.Thin solid films2010 / 9, p. 2374-2376

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artikkel kogumikus

Interaktsioon punktdefektide ja lisandite vahel süsteemis Si-SiO2 ja nende mõju piirpinna omadustele : [ettekande sisukokkuvõte]Kropman, Daniel; Kärner, T.; Heinmaa, I.Eesti Füüsika Seltsi aastaraamat 20082009 / lk. 119-120

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artikkel ajakirjas

Investigation of strain relaxion mechanism in Si-SiO2 system during the process of its formationKropman, Daniel; Poll, V.; Kärner, T.; Ugaste, Ülo; Mellikov, Enn; Arbu, Uno; Paomets, V.Physica status solidi (a)2003 / 2, p. 297-301

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artikkel ajakirjas

Low-K factor of SiO2 layer on Si irradiated by YAG:Nd laserMedvid, A.; Onufrijevs, Pavels; Mellikov, Enn; Kropman, Daniel; Muktepavela, F.; Bakradze, G.Journal of non-crystalline solids2007 / p. 703-707 : ill

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artikkel kogumikus

Point defects interaction with extended defects and impurities and its influence on the Si-SiO2 system propertiesKropman, Daniel; Arbu, Uno; Kärner, T.; Ugaste, Ülo; Mellikov, Enn; Kauk, Marit; Heinmaa, I.; Samoson, Ago; Medvid, A.Gettering and defect engineering in semiconductor technology. XI2005 / p. 333-338 : ill

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artikkel kogumikus

Point defects interaction with extended defects in the Si-SiO2 system [Electronic resource]Kropman, Daniel; Kärner, T.; Abru, Uno; Ugaste, Ülo; Mellikov, EnnProceedings IVC-16 : Venice, 20042004 / p. SS1-TuP394 [CD-ROM]

artikkel kogumikus

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artikkel kogumikus

Strain relaxation mechanism in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Volobujeva, Olga; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.Radiation Interaction with Materials and its use in Technologies : Kaunas, 24-27.09.20082008 / p. 204-207

artikkel kogumikus

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artikkel ajakirjas

Strain relaxation mechanism in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Öpik, Andres; Lott, Kalju; Volobujeva, Olga; Kärner, T.; Heinmaa, I.; Laas, Tõnu; Medvid, A.Physica B : condensed matter2009 / 23/24, p. 5153-5155 : ill

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artikkel ajakirjas

Stress relaxation mechanism by strain in the Si-SiO2 system and its influence on the interface propertiesKropman, Daniel; Mellikov, Enn; Kärner, Tiit; Laas, Tõnu; Medvid, Arthur; Onufrijevs, Pavels; Dauksta, EdvinsSolid state phenomena2011 / p. 259-262

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artikkel ajakirjas

Understanding and control of stress at Si-SiO2 interfaceKropman, Daniel; Seeman, Viktor; Medvids, Arturs; Onufrijevs, Pavels; Vitusevich, Svetlana; Mikli, ValdekKey engineering materials2020 / p. 291−296 https://doi.org/10.4028/www.scientific.net/KEM.850.291

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artikkel kogumikus

Влияние неоднородностей в моно- и поликристаллическом Cds на фотоэлектрические и длинновременные неравновесные свойстваKropman, Daniel; Lott, Kalju; Šeinkman, M.Физика, химия и технические применения полупроводников A2B6 : тезисы докладов IV всесоюзного совещания (Одесса, 16-19 ноября 1976 г.)1976 / с. 123 https://www.ester.ee/record=b2969209*est

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artikkel ajakirjas

Влияние облучения низкоэнергетическими электронами в растровом электронном микроскопе на параметры полупроводниковых приборовMeiler, Boriss; Kropman, Daniel; Levtšenkova, AllaМикроэлектроника1987 / с. 165-169 : илл https://www.ester.ee/record=b2147720*est

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artikkel kogumikus

Исследование температурного тушения фотопроводимости в пленках CdSKropman, DanielПолупроводниковые материалы. 11969 / с. 107-113 : илл https://www.ester.ee/record=b1346474*est https://digikogu.taltech.ee/et/Item/da24f532-932d-41c5-8925-a52dfa4b18c8/

artikkel kogumikus

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artikkel kogumikus

Исследование термостимулированной провидимости и эффекта Холла в пленках CdSKropman, DanielПолупроводниковые материалы. 11969 / с. 97-105 : илл https://www.ester.ee/record=b1346474*est https://digikogu.taltech.ee/et/Item/da24f532-932d-41c5-8925-a52dfa4b18c8/

artikkel kogumikus

Kropman, Daniel (autor)

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