Kropman, D., Kärner, T., Samoson, A., Heidmaa, I., Ugaste, Ü., Mellikov, E.

prindi

Interaction between point defects in the Si-SiO2 system during the process of its formation

autor

Kropman, Daniel

Kärner, T.

Samoson, Ago

Heidmaa, I.

Ugaste, Ülo

Mellikov, Enn

vastutusandmed

D.Kropman, T.Kärner, A.Samosson, I.Heidmaa, Ü.Ugaste, E.Mellikov

allikas

Defect and Diffusion Forum

ilmumiskoht

[S. l.]

kirjastus/väljaandja

Elsevier

ilmumisaasta

2001

leheküljed

p. 1737-1744

Kropman, D., Kärner, T., Samoson, A., Heidmaa, I., Ugaste, Ü., Mellikov, E. Interaction between point defects in the Si-SiO2 system during the process of its formation // Defect and Diffusion Forum. [S. l.] : Elsevier, 2001. p. 1737-1744.