prindi

Hierarchical analysis of short defects between metal lines in CMOS IC

autor
Pleskacz, Witold A.
Jenihhin, Maksim
Raik, Jaan
Rakowski, Michal
Ubar, Raimund-Johannes
Kuzmicz, Wieslaw
vastutusandmed
Witold A.Pleskacz, Maksim Jenihhin, Jaan Raik, Michal Rakowski, Raimund Ubar, Wieslaw Kuzmicz
allikas
Proceedings : 11th EUROMICRO Conference on Digital System Design : Architectures, Methods and Tools : (DSD 2008) : September 3-5, 2008, Parma, Italy
ilmumiskoht
Los Alamitos
kirjastus/väljaandja
IEEE Computer Society
ilmumisaasta
2008
leheküljed
p. 729-734 : ill
leitav
https://ieeexplore.ieee.org/document/4669309
märksõna
defektid
füüsika
modelleerimine (teadus)
testimine
ISBN
978-0-7695-3277-6
märkused
Bibliogr.: 19 ref
keel
inglise
Pleskacz, W.A., Jenihhin, M., Raik, J., Rakowski, M., Ubar, R.-J., Kuzmicz, W. Hierarchical analysis of short defects between metal lines in CMOS IC // Proceedings : 11th EUROMICRO Conference on Digital System Design : Architectures, Methods and Tools : (DSD 2008) : September 3-5, 2008, Parma, Italy. Los Alamitos : IEEE Computer Society, 2008. p. 729-734 : ill. https://ieeexplore.ieee.org/document/4669309